基本情况

周丽星，女，工学博士，讲师，硕士研究生导师。2019年6月毕业于中国科学院微电子研究所，获得微电子学于固体电子学博士学位。2019年8月至今在北京工业大学微电子学院担任讲师。主要从事锗基器件与工艺、铪基铁电晶体管相关的研究工作，主持北京市自然科学基金项目1项，北京市博士后基金项目1项、北京市朝阳区博士后资助项目1项。

招生方向

0809电子科学与技术（学术学位）

0854集成电路工程（专业学位）

欢迎电子科学与技术、微电子、物理等相关专业的同学报考学术型或专业型硕士研究生。

代表性论文

第一作者发表国际学术期刊和国际会议论文14篇。

代表性SCI论文：

1.Lixing Zhou, Xiaolei Wang, Kai Han, Xueli Ma, Yanrong Wang, Jinjuan Xiang, Hong Yang, Jing Zhang, Chao Zhao, Tianchun Ye, and Wenwu Wang, “Experimental Investigation of Remote Coulomb Scattering on Mobility Degradation of Ge pMOSFET by Various PDA Ambiences”, IEEE Transactions on Electron Devices, Vol 66, No 4, pp. 1669–1674, 2019.

2.Lixing Zhou, Xiaolei Wang, Kai Han, Xueli Ma, Yanrong Wang, Jinjuan Xiang, Hong Yang, Jing Zhang, Chao Zhao, Tianchun Ye, and Wenwu Wang, “Understanding dipole formation at dielectric/dielectric hetero-interface”, Applied Physics Letters, Vol 113, No 18, pp. 181601, 2018.

3.Lixing Zhou, Xiaolei Wang, Xueli Ma, Kai Han, Yanrong Wang, Jinjuan Xiang, Hong Yang, Jing Zhang, Chao Zhao, Tianchun Ye, and Wenwu Wang, “Identification of interfacial defect in a Ge gate stack based on ozone passivation”, Semiconductor Science and Technology, Vol 33, No 11, pp. 115005, 2018.

4.Lixing Zhou, Xiaolei Wang, Xueli Ma, Jinjuan Xiang, Hong Yang, Chao Zhao, Tianchun Ye, and Wenwu Wang, “Hole mobility degradation by remote Coulomb scattering and charge distribution in Al₂O₃/GeO_xgate stacks in bulk Ge pMOSFET with GeO_xgrown by ozone oxidation” Journal of Physics D: Applied Physics, Vol 50, No 24, pp. 245102, 2017.

5.Lixing Zhou, Xiaolei Wang, Xueli Ma, Kai Han, Yanrong Wang, Jinjuan Xiang, Hong Yang, Jing Zhang, Chao Zhao, Tianchun Ye, and Wenwu Wang, “Comprehensive investigation of the interfacial charges and dipole in GeO_x/Al₂O₃gate stacks of Ge MOS capacitor by post deposition annealing”, Japanese Journal of Applied Physics, Vol 57, No 10, pp. 101101, 2018.

联系方式

邮箱：zhoulixing@bjut.edu.cn

地址：北京市朝阳区平乐园100号北京工业大学信息学部微电子学院（邮编：100124）